In order to meet the growing needs of semiconductor customers for large-area scanning and nanoscale metrology, Park Systems (Park Systems, hereinafter referred to as Park) has recently launched the Park NX-Hybrid WLI semiconductor machine, which can provide users with comprehensi

Park Systems (hereinafter referred to as: Park) In order to meet the growing needs of semiconductor customers for large-area scanning and nanoscale metrology, has recently launched the Park NX-Hybrid WLI semiconductor machine , which can provide users with comprehensive metering solutions. This machine can not only achieve sub-angstrom-level high-precision microtopography measurement, but also has the advantages of large measurement area and high throughput during imaging.

Parker will bring new products to participate in the APCSCRM 3rd Asia-Pacific International Conference on Silicon Carbide and Related Materials to be held on July 20-22. We sincerely invite you to visit!

APCSCRM The 3rd Asia Pacific International Conference on Silicon Carbide and Related Materials

Date: July 20-22, 2022

Location: Xuzhou Burton Wyndham Hotel (No. 16, Longhu West Road, Economic Development Zone, Xuzhou City)

Parker Booth: 44 No.

Park NX-Hybrid WLI semiconductor machine, as a powerful semiconductor metrology tool, integrates the core advantages of atomic force microscope (AFM) and white light interferometer (WLI) profile measurement technology for the first time. for an optimal system. Among them, white light interferometry (WLI) is a non-destructive, non-contact optical technology used to generate high-fidelity 2D and 3D contour models, which has now become the quality assurance of semiconductor production. However, WLI alone can no longer meet specific needs, and Park NX-Hybrid WLI has emerged for higher resolution and accuracy applications such as advanced chemical mechanical polishing (CMP) metrology and monitoring, dents, corrosion and edges. Excessive corrosion (EOE), film thickness, column height, pore structure and mold comparison. In addition, it can be applied to advanced packaging including through silicon via (TSV), microbump measurement redistribution layer (RDL) measurement and photoresist residue detection.

△Park NX-Hybrid WLI

Different from traditional independent WLI and AFM systems, Park NX-Hybrid WLI implements more functions in a seamless manner and creates a complete integrated tool at very low cost, combining the two With two tools mounted on the same rack and fed by an EFEM, the system creates fully integrated and exchangeable data, reducing wafer fab footprint and increasing throughput over larger areas. In this integrated system, Park AFM based on Park NX-Wafer is the industry's leading automated atomic force microscope system for semiconductors and related equipment, which can perform online production quality assurance and research and development. The combined AFM/WLI system uses the WLI module to provide high-throughput imaging in an ultra-wide area, and uses the AFM to provide nanoscale metrology with sub-angstrom height resolution in the required area. Among them, the "hot spot detection" technology can quickly locate the defect location of high-resolution AFM. This system can use this technology to compare and reference images of target sample areas to detect defects in pattern structures.

Park WLI module supports white light interferometry (WLI) and phase shift interferometry (PSI) modes. PSI mode is enabled by the motorized filter changer, the two objectives can be automatically replaced by the motorized lens, supports 2.5x, 10x, 20x, 50x objective magnification, and has 100x CMOS camera functionality.

Park NX-Hybrid WLI combines two complementary technologies and is a comprehensive and comprehensive automated metering system. This system provides significant cost savings compared to two separate systems.

The new Park NX-Hybrid machine currently launched is part of a series of hybrid metrology products that Park plans to launch this year to enhance and improve the utilization of atomic force microscopes in major industrial and academic research applications.

About Park Corporation

Korea Park Co., Ltd. (Park) was established in 1988. is the world's first listed company to launch commercial atomic force microscope products . Park has been established for more than 30 years and has always been committed to morphology & mechanical measurement in the nanometer field and the development of new semiconductor technologies and products.Park uses a flatbed scanner with separated XY and Z axes, plus an exclusive true non-contact mode, which can avoid image distortion and data inconsistency caused by probe wear during the topography scanning process; fast imaging technology can also greatly improve Test efficiency and reduce experimental testing costs. Since its establishment,

Park has been committed to the development of new products and new technologies, solving various technical problems for customers and providing the most complete solutions. Park's atomic force microscopes are recognized by customers for their high-end product quality and fast and excellent after-sales service. In order to provide customers with efficient and convenient after-sales service, the Beijing representative office of Korea Park Co., Ltd. has established an after-sales service center and is equipped with a spare parts warehouse.

Contact number: 400-878-6829

Official website link: www.parksystems.cn

Park Beijing Branch

Room 518, Tianchuang Technology Building, No. 8 Caihefang Road, Haidian District, Beijing

Park Shanghai Laboratory

Shanghai Shen No. 518, Chang Road, Hongqiao No. 305, Block C, Green Valley

Park Guangzhou Laboratory

Building B, Tianhebei Cultural and Creative Garden, No. 200 Wushan Road, Tianhe District, Guangzhou 211