videos please see the link below:
1977, Wuxian, Jiangsu Province held a national lithography machine symposium, which clearly stated that lithography equipment should be improved and the world's advanced level should be caught up as soon as possible. Therefore, Department of Precision Instruments of Tsinghua University, , Institute of China Electronics Technology 45, etc. successively invested in the development of more advanced lithography machines.
After entering the 1980s, domestic lithography machines have experienced many good news.
1980, after day and night research, Xu Duanyi's team at Tsinghua University finally developed a distributed projection lithography machine.
In 1985, the step-by-step projection lithography machine developed by the Institute of Electrical Technology 45 of China Electronics passed the technology identification of the electronic department: it reached the level of the 4800DSW lithography machine launched by the US GCA in 1978.
0 So far, the gap in lithography machines between China and the United States is only 7 years away. Asmay, which will dominate the field of lithography machines in the future, has just been born at this time.
Although the foundation is weak and everything starts from scratch, with the efforts of countless ancestors day and night, Chinese lithography machines have won a better starting point.
What is really embarrassing is that although there are domestic lithography machines, scientific research results do not represent the ability to mass production, and industrialization has been stagnant.
In July 1977, at a symposium on science and education workers held in Great Hall of the People, the soul of semiconductor Wang Shouwu bluntly said: "There are more than 600 semiconductor production factories in the country, and the total amount of integrated circuits produced in one year is only one-tenth of the monthly output of a large Japanese factory."
Adversity
After the reform and opening up, a craze for introducing foreign equipment emerged across the country, and the semiconductor industry began to suffer a fierce external impact.
1980, the Jiangnan Radio Equipment Factory of Wuxi (Factory 724) introduced the Japanese Toshiba TV integrated circuit 5 micron production line. This is the first time in China to introduce an integrated circuit production line from abroad. In just a few years, the chip output in the factory reached 30 million yuan, and Factory 742 became the largest integrated circuit production plant in China.
Although the technology introduction of Factory 742 has been very successful, from a general perspective, the chip industry has encountered the problems of repeated introduction and overly dispersed.
In the context of expanding opening up to the outside world, the trend of "it is better to buy than to make" has spread rapidly across the country. 33 units have introduced various integrated circuit production equipment to varying degrees, with a total investment of about 1.3 billion yuan.
However, most of the equipment introduced are second-hand goods that are backward and eliminated, and in the end only a few production lines have been built and used.
And a research report that year pointed out that during the introduction process, a large amount of hardware was introduced, while technology and management were ignored. At the same time, scientific research and production were not closely integrated, and insufficient funds were also an important reason.
Therefore, the originally conceived policy of "introduction, digestion, absorption, and innovation" has not been fully implemented, but has been introduced again and again.
By 1988, my country's annual output of integrated circuits finally reached 100 million yuan. The United States met this standard in 1968, Japan reached it in 1970, and China finally met this standard after 23 years since it produced the first integrated circuit in 1965.
So in the 1980s, China's semiconductors not only lag significantly behind the United States and Japan, but also gradually became surpassed by South Korea.
Faced with the terrifying gap with developed countries, the 908 and 909 projects, which spanned ten years, have been launched.
But the actual effect is far from expectations. The chip industry has developed rapidly without the support of the market, capital and talents. As a result, it will either be backward or not understand the technology introduced, let alone independent innovation.
Dawn
Time came in 1999, when NATO invaded Kosovo , the United States paralyzed almost all network systems of Yugoslavia through electronic information warfare.
For this reason, relevant departments held emergency meetings and discussions many times: Once they break up with the United States, what threat will national information security face?
Subsequently, "Several Policies to Encourage the Development of the Software Industry and Integrated Circuit Industry" was issued, and lithography machines were included in the "863 Major Science and Technology Research Plan".
With the strong support of policies, the chip industry has entered an era of returnees' entrepreneurship and the rise of private enterprises, and the domestic lithography machine industry has once again started hard.
At this time, the international lithography light source had been trapped in 193nm for 20 years. Finally, TSMC proposed an immersive lithography solution in 2002. Asmay also defeated Nikon with this and became the overlord of the new generation of lithography machines.
At this time, the 193nm lithography machine project has just been launched in China, which is more than 20 years behind the international level.
After five years of hard pursuit, Shanghai Microelectronics finally announced the development of a 90nm lithography machine in 2007. However, since most of the components come from abroad, the West immediately imposed an embargo, resulting in the inability to mass production.
In 2008, the "02 Special Project" was launched, continuing to research and focus on high-end lithography machine technology. At the same time, in view of the previous lessons, the focus of the "02 Special Project" also improves the supporting capabilities of industries such as materials and crafts.
In 2016, Shanghai Microelectronics 90nm lithography machine was mass-produced, and Huazhuo Jingke successfully developed two sets of dual-bench prototypes, becoming the second company in the world to master this technology after Asmay.
At this point, although domestic lithography machines have not yet completely escaped from the predicament, after more than 20 years of hard pursuit, China's lithography machines and even the entire chip industry have finally gradually blossomed and bear fruit after learning from previous development lessons.
Just when the situation was getting better, the United States began to encircle China's chip industry, and the worries more than ten years ago finally became a reality.
Review of the development of China's lithography machines in the past 60 years, in the first 20 years, under the research of scientific researchers day and night, the gap between China and the United States lithography machines was shortened to 7 years, and in the middle of more than ten years, due to various reasons, the gap between lithography machines at home and abroad became wider and wider. Until 2000, facing the threat of supply cutoff and the terrifying gap with foreign countries, domestic lithography machines began to strive to catch up again.
Although China's chip industry chain is still far from that of foreign countries, unlike before, the difference is that national policies continue to be put in place, financial support is in place, the team of engineers continues to grow, and all links of the industrial chain are no longer the same.
China's chip industry chain already has many factors for success.
, that’s all for this issue. If you have any topics of interest, please leave a message. See you next time.
References:
1. China's former lithography machine research and development with Xu Duanyi, Zhang Zhengyuan
2. Domestic lithography machine fifty years: Can a spark start a prairie fire? Chen Chen
3. China's past: How many suffering can we survive to achieve catching up and surpass? Boss Dai
4. The second phase of the 109th stage of the Chinese Academy of Sciences (1958-1986), the Institute of Microelectronics, Chinese Academy of Sciences
5. [China Science Daily] Drawing a scientific and technological blueprint for the motherland - one of the special reports on the 60th anniversary of the founding of the Department of Academic College of the Chinese Academy of Sciences, Ding Jia
6. GK-3 type semi-automatic lithography machine working principle and performance analysis, Liu Zhonghua
7. The lithography machine symposium was held in Wuxian, Jiangsu Province, semiconductor equipment
8. KG-3 designed and manufactured by my country The semi-automatic lithography machine passed the identification in Shanghai, Xu Xinpei
9. Lithography technology for 60 years, Chen Baoqin
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-